Atomic Layer Deposition (ALD) is a technique that is used to
deposit thin films of materials on a substrate with precise thickness control.
This technique has many applications in various fields, such as
microelectronics, nanotechnology, and surface engineering. The atomic layer
deposition equipment is essential for the successful implementation of this
technique. In this essay, we will discuss the various aspects of atomic layer
The atomic layer deposition equipment consists of several
components that work together to deposit the thin films on the substrate. The
main components are the reaction chamber, precursor delivery system, and the
substrate holder. The reaction chamber is a vacuum chamber where the deposition
process takes place. The precursor delivery system delivers the precursor gases
into the reaction chamber, and the substrate holder holds the substrate in
place during the deposition process.
One of the most critical aspects of the atomic layer
deposition equipment is the precursor delivery system. The precursor gases need
to be delivered precisely to ensure that the deposited film has the desired
properties. The precursor delivery system typically consists of a series of
valves and mass flow controllers that control the flow rate of the precursor
gases. The flow rate and timing of the precursor gases are critical in ensuring
that the deposited film has the desired thickness and properties.
Another important component of the atomic layer deposition
equipment is the substrate holder. The substrate holder must be designed to
hold the substrate in place during the deposition process while still allowing
for the precursor gases to reach the substrate. The substrate holder must also
be designed to accommodate different sizes and shapes of substrates.
The reaction chamber is also an important component of the
atomic layer deposition equipment. The reaction chamber must be able to
maintain a vacuum environment to ensure that the precursor gases can react with
the substrate surface without interference from other gases. The reaction
chamber must also be able to maintain a constant temperature during the
deposition process to ensure that the deposited film has the desired
In addition to the main components, the atomic layer
deposition equipment may also have additional components such as plasma
sources, ion sources, and temperature controllers. These additional components
can enhance the properties of the deposited film and increase the flexibility
of the deposition process.
In conclusion, the atomic layer deposition equipment is
essential for the successful implementation of the atomic layer deposition
technique. The equipment consists of several components that work together to
deposit thin films of materials on a substrate with precise thickness control.
The precursor delivery system, substrate holder, and reaction chamber are the
main components of the atomic layer deposition equipment. The precise control
of the precursor gases and the reaction conditions is critical in ensuring that
the deposited film has the desired properties. The atomic layer deposition
equipment can also have additional components that can enhance the properties
of the deposited film and increase the flexibility of the deposition process.
Atomic Layer Deposition (ALD) Equipment Market Dynamics
Drivers in Atomic
Layer Deposition Equipment Market
The ALD equipment market is influenced by various factors,
with one of the major drivers being the constant evolution of the semiconductor
industry. Technological advancements, including IoT, AI, and 5G, have led to
the development of data-driven solutions, compelling many companies to invest
extensively in R&D activities to create advanced solutions using these
This has resulted in a surge in demand for ICs to embed in
devices, allowing the development of efficient and smart solutions. The trend
of lightweight, miniaturized, and fast electronic devices has further fueled
demand for compact and complex ICs, driving the growth of the ALD equipment
market. ALD plays a vital role in this by enabling the deposition of ultra-thin
nano-layers on various substrates, facilitating the development of smaller ICs
without compromising performance.
The demand for semiconductor chips used in electronic
products is expected to increase, leading to higher output in the semiconductor
manufacturing industry. ALD is a crucial technique for depositing materials
during semiconductor fabrication. However, the COVID-19 pandemic had a negative
impact on the ALD market growth due to the significant impact on the semiconductor
industry. The overall market growth was also affected by reduced demand for
industrial manufacturing of lithium-ion batteries and solar cells.
Nevertheless, the market is expected to recover with increased precautions and
vaccinations during the forecast period.
Atomic Layer Deposition (ALD) Equipment Market
The depletion of non-renewable resources has caused a surge
in demand for renewable energy sources. As per the International Energy Agency
(IEA), renewable energy accounted for 28% of the total energy consumed
worldwide in 2021. Photovoltaics (PV) cells and solar panels help convert
sunlight into electricity, and with the increasing energy crisis, there has
been a rise in demand for solar energy. This has created a lucrative
opportunity for market players offering solutions for Atomic Layer Deposition
(ALD), which is widely used in solar cells for various purposes, including
surface passivation, buffer layers, window layers, absorber layers, and
hole/electron contacts. The growing demand for photovoltaics is expected to boost
the market growth for ALD.
Governments around the world are investing in and promoting
the use of electric vehicles due to growing concerns about global warming and
environmental pollution. As a result, the market for Lithium-ion batteries is
gaining momentum as a source of energy for vehicles. Atomic layer deposition is
positively affecting the market growth as it is used to deposit Nanostructured
materials in lithium-ion batteries.
Innovation and product development in solar cells, supported
by increased investment in renewable energy technology, are expected to drive
the growth of the atomic layer deposition market. For example, manufacturers of
photovoltaic cells in China are switching to atomic layer deposition
technology. The demand for lightweight and portable devices has been on the
rise due to the development of numerous innovative and energy-efficient
technologies. The atomic layer deposition process is widely used for
fabricating semiconductor chips, which is expected to drive market growth
during the forecast period.
The expansion of tiny electronic devices has been greatly
enhanced by the atomic layer deposition process. The increased adoption of
electronics and semiconductor technologies globally is another factor driving
the growth of the atomic layer deposition market. The automotive sector is also
expected to expand the market for atomic layer deposition during the forecast
Challenges in Atomic
Layer Deposition (ALD) Equipment Market
Semiconductor manufacturing involves complex processes that
require clean rooms and equipment. The presence of even a small amount of dust
can cause significant financial losses, delays in supply, and order
cancellations. Common challenges in semiconductor manufacturing include defects
in raw materials, mechanical integrity, and chip-level problems. To produce
high-quality semiconductor devices and ICs, advanced and innovative
technologies are required, which has increased the complexity of wafers due to the
presence of multiple patterns at the chip level.
Atomic Layer Deposition (ALD) requires a high degree of
cleanliness, but this can be challenging to maintain when process nodes are
extremely small. Technicians must ensure that there is no leakage during ALD,
as the gases used in the production processes can be hazardous. The increasing
number of challenges involved in semiconductor manufacturing may hinder the
market growth for ALD.
Thermal ALD is the leading product segment and accounted for
36.3% of the global revenue share in 2021. This technique is widely used for
depositing aluminum-containing molecules and forms uniform layers with surface
control and conformity, regardless of the surface geometry. The rising demand
for aluminum oxide film, using this deposition technique, is also expected to increase
The deposited aluminum oxide film is known to have effective
permeation barriers due to its pin-hole-free morphology and uniformity. Its
excellent properties, ease of access to precursor materials, and stability on
various substrates are contributing factors to the segment's growth.
Atomic layer deposition (ALD) has become a widely adopted
process in the global microelectronics industry due to its ability to produce
precise thickness and uniform surface coverage. This breakthrough technology
offers superior uniformity, conformality, and atomic-level control, allowing 3D
structures to be coated with a conformal layer.
ALD equipment refers to systems or equipment used to produce
ultra-thin films on surfaces. The demand for this equipment is on the rise due
to its increasing adoption across various industries. ALD has become an ideal
technique for producing high-quality films for magnetic recording heads, DRAM
capacitors, MOSFET gate stacks, and other products that require precision and
uniformity. As the demand for these products increases, it will boost the
global ALD equipment industry.
The growing applications of ALD in solar cell manufacturing
are likely to further drive sales of ALD equipment. The ability to deposit
high-quality and conformal films with precise thickness control has made ALD
equipment increasingly popular in this field.
Moreover, the rising trend of miniaturization worldwide is
creating lucrative opportunities for ALD equipment manufacturers, particularly
in biomedical and electro-optic applications. ALD equipment has allowed
end-users to develop miniaturized devices with high performance, making it a
desirable technique for various industries.
In recent years, the semiconductor and electronics sector
has been leading the adoption of atomic layer deposition technology. The demand
for customized medical equipment has been growing significantly, which is
positively impacting the sales of atomic layer deposition equipment.
The growing demand for lithium-ion batteries and solar cells
is expected to drive the sales of atomic layer deposition equipment. The
expansion of the lithium-ion batteries market due to increasing usage in
electric vehicles will create opportunities for ALD equipment manufacturers.
The market for atomic layer deposition equipment is expected
to be driven by the rising need for semiconductors and power-converting
devices. Furthermore, the rising usage of medical devices and smartwatches is
creating a growing need for solid-state thin-film batteries, which will further
boost the demand for atomic layer deposition equipment.
The global market for atomic layer deposition equipment will
also benefit from the development and popularity of implantable cell phones.
The introduction of new goods and technologies, such as plasma-enhanced ALD
technology, will further elevate the demand for atomic layer deposition.
The increasing need for intricate and small-scale parts and
the numerous advantages offered by atomic layer deposition, such as its ability
to improve film properties at low temperatures, will support the market growth.
The ALD technique is currently being used in various devices
to enhance the efficiency of tin-sensitive solar cells. Government incentives to
promote the solar energy sector will also support the expansion of the atomic
layer deposition equipment industry.
The demand for atomic layer deposition products is being
driven by several key factors. The miniaturization of electronic devices,
advancements in technology, and the growing need for energy-efficient devices
are among the most significant factors.
The semiconductor industry relies heavily on atomic layer
deposition (ALD) to deposit thin films on microchips, resulting in the
shrinking of electronic devices such as smartphones and laptops. ALD is also
used to produce high-quality coatings for various applications such as solar
panel protection, catalytic coatings for fuel cells, and optical coatings for
The demand for ALD has increased significantly due to
significant improvements in ALD technology, including the development of novel
precursors and better reactor designs. The spectrum of applications for ALD has
expanded greatly as a result.
The growing demand for energy-efficient products, such as
LED lights, has also contributed to the increased demand for ALD equipment. The
focus on reducing energy consumption and carbon emissions has spurred the
demand for such products, which in turn has driven the growth of the ALD
Government financing for technological research and
development, as well as incentives, has also helped to expand the ALD equipment
Restraints in Atomic
Layer Deposition (ALD) Equipment Market
The need for skilled technicians to handle the complex
front-end wafer fabrication processes in the semiconductor industry such as
lithography, wafer cleaning, wafer surface conditioning, and deposition is a
major restraint to the growth of the ALD equipment market. Although there are
numerous growth opportunities available due to the increasing demand for
semiconductor devices from various end-user industries, the shortage of skilled
workforce has been limiting the market players from fully exploiting these
Moreover, the market growth is hindered by various other
factors, including high investments, lack of technical expertise, limited
applications, and restricted access to precursors. Small and medium-sized
businesses face significant barriers to entry in the ALD market due to
extensive capital expenditures required for equipment such as reactors and
precursors. In addition, ALD is a complicated procedure that requires specific
knowledge and technological competence, limiting the number of businesses that
can provide ALD services.
ALD depends on a small number of expensive and
challenging-to-obtain precursors, which might cause problems in the supply
chain and result in production delays. Furthermore, there are strict
regulations governing the usage, storage, and disposal of hazardous chemicals,
including the precursors used in ALD, which make the process more expensive and
Although ALD has a large market in the semiconductor sector,
its application in other industries is limited. Therefore, overcoming these
obstacles is essential to maximize the potential of ALD technology in the
During the forecast period, the ALD equipment market growth
for medical applications is expected to register the highest CAGR due to the
increasing demand for smart and connected healthcare solutions, wearables, and
implants. The use of ALD is suitable for medical devices as most of the
materials used in ALD are biocompatible. The adoption of ultra-thin
biocompatible ALD coatings improves adhesion to the bone and protects patients
from leakages from the implant to the body, making it highly suitable for
The fastest growing product segment is plasma-enhanced ALD,
registering a CAGR of 12.6% during the forecast period. The demand for this
product is due to its advantages, such as encouraging the deposition of thin
films at lower temperatures and a higher growth compared to traditional
deposition approaches like thermal ALD.
While the technology type concerning enhanced nucleation
holds a smaller share of the overall market due to high capital costs and
specific applications, extensive research initiatives for the technology have
resulted in the deposition of particles and polymers. For instance, ALD on
polymers mitigates numerous challenges concerning space polymers. However, it
reduces the rate of oxygen-atom erosion and vacuum ultraviolet of polymers in
The electronics & semiconductors segment has led the
market, accounting for 45.2% of the global ALD market revenue share in 2021.
The increasing demand for electronic components in the automotive industry is
anticipated to propel the demand for semiconductors, positively impacting the
atomic layer deposition market.
The solar devices segment is projected to be the most
opportunistic segment during the forecast period, with the rising acceptance
and popularity of solar gadgets driving the segment's growth. As the
environmental effects of utilizing conventional devices and powers result in
emissions, specific initiatives have been taken by governments to move towards
extensive usage of green energy.
The demand for atomic layer deposition (ALD) of fluorides
has increased significantly due to their low refractive index and improved
transmission at UV and IR wavelengths, making them suitable for optical
applications. Fluoride compounds, such as aluminum fluoride, are used to
develop protective coatings on lithium-ion batteries. ALD of metal fluorides
ensures superior transmission at UV wavelengths and facilitates the deposition
of ultra-thin films to prevent absorption losses, making them ideal for
ALD equipment for More Moore applications is expected to
account for the largest share of the market during the forecast period. The
growing demand for 3D NAND flash memory technology and interconnect
technologies is expected to drive the market growth for ALD equipment. The
increasing usage of various logic devices and memory technologies is also
expected to contribute to the market growth for More Moore applications.
The rising concern about global warming has led to a change
in government aims to reduce carbon footprints, leading to the growing adoption
of environmentally friendly technologies. The increasing demand for electric
vehicles across the world is contributing to the growth of the lithium-ion
battery market, which subsequently drives demand for ALD equipment.
Moreover, the changing consumer preferences and government
initiatives to reduce greenhouse gas emissions have resulted in the swift
growth of the solar sector. ALD technique is widely used for conformal coatings
in solar cells and devices, making solar devices the fastest-growing
application sector during the prediction period.
Key Companies in Atomic Layer Deposition (ALD) Equipment
- ASM INTERNATIONAL N.V.
- TOKYO ELECTRON LIMITED
- APPLIED MATERIALS, INC.
- LAM RESEARCH CORPORATION
- VEECO INSTRUMENTS INC.
- KURT J. LESKER COMPANY
- OPTORUN CO., LTD.
- CVD EQUIPMENT CORPORATION
- EUGENE TECHNOLOGY CO. LTD.
- FORGE NANO INC.
- WONIK IPS
- SENTECH INSTRUMENTS GMBH
- LOTUS APPLIED TECHNOLOGY
- NCD CO., LTD.
- JIANGSU LEADMICRO GUIDE NANO EQUIPMENT TECHNOLOGY CO., LTD.
- NANO-MASTER, INC.
- NAURA TECHNOLOGY GROUP CO., LTD.
- OXFORD INSTRUMENTS PLC
- SAMCO INC.
- CN1 CO., LTD.
- SHOWA SHINKU CO., LTD.
- ANRIC TECHNOLOGIES
- Pico sun Oy
- Arradiance, LLC
Recent Developments in Atomic Layer Deposition Equipment
Several recent developments have taken place in the atomic
layer deposition equipment market. In June 2022, Applied Materials announced
its acquisition of Picosun Oy, a global leader in ALD based in Finland. This
acquisition is expected to help Applied Materials provide innovative solutions
for various markets such as IoT, communications, automotive, sensor, and power,
by leveraging Picosun's capabilities. Applied Materials aims to expand its portfolio
related to specialty chips with this acquisition.
In March 2022, ASM International N.V. acquired Reno
Sub-Systems Inc., a company that offers RF matching sub-systems for equipment
used in semiconductor manufacturing. ASMI's objective is to enhance its plasma
products portfolio by utilizing Reno's RF generators and matching networks.
In September 2020, Lam Research Corporation introduced the
Striker FE ALD system, specifically designed for manufacturing high
aspect-ratio chip architectures. The system utilizes ICEFill technology to fill
structures in 3D NAND, logic devices, and DRAM chips.
In September 2019, Tokyo Electron Limited announced the
merger of its subsidiaries TEL FSI, Inc. and TEL Epion Inc., thereby optimizing
and enhancing its manufacturing processes and operational efficiency.
Lastly, in May 2017, Veeco Instruments Inc. acquired
Ultratech, Inc., a leading supplier of lithography, laser processing, and
inspection systems used in the production of LEDs and other semiconductor
devices. This acquisition allowed Veeco to strengthen its product portfolio of
advanced packaging lithography systems. These recent developments in the atomic
layer deposition equipment market demonstrate the industry's focus on
innovation and expansion.
The Atomic Layer Deposition (ALD) Equipment Market has been
witnessing significant growth over the past few years, and the trend is
expected to continue in the coming years. This growth can be attributed to the
increasing demand for ALD equipment from various industries, including
electronics and semiconductors, medical, solar devices, and others.
In recent years, the ALD Equipment Market has witnessed
several developments, including technological advancements, product launches,
partnerships, and collaborations. For instance, in 2021, Veeco Instruments Inc.
launched the SPECTOR-HT™ ALD system, which is a high-throughput ALD system that
enables the deposition of high-quality films at low temperatures.
In 2022, Sentech Instruments GmbH introduced the ALD 500
system, which is designed for high-throughput and high-quality ALD deposition
on large substrates. The system is suitable for a wide range of applications,
including solar cells, sensors, and advanced coatings.
Furthermore, several companies are investing heavily in
R&D activities to develop innovative ALD equipment to cater to the
increasing demand from various end-use industries. In 2021, Oxford Instruments
Plasma Technology Ltd. announced the launch of the ALD150LX system, which is a
low-temperature, plasma-enhanced ALD system designed for research and
Partnerships and collaborations are also significant
developments in the ALD Equipment Market. In 2021, ASM International N.V. and
Tokyo Electron Limited announced a collaboration to develop and promote advanced
ALD processes for the semiconductor industry. This collaboration aimed to
accelerate the adoption of new ALD technology in the semiconductor industry.
In conclusion, the ALD Equipment Market is witnessing
significant developments in terms of technological advancements, product
launches, partnerships, and collaborations. The increasing demand for ALD
equipment from various industries is driving the growth of the market, and the
trend is expected to continue in the coming years.